Intel will bring a performance-improving feature to its chips one year ahead of TSMC،
Intel's process nodes will increase from 20A this year to 14A by 2027
Intel will launch its 18A process node next year
But starting with its 20A production later this year, Intel will have a head start on TSMC and Samsung Foundry with a key feature the US chipmaker calls PowerVia (also known as backside power delivery). TSMC is expected to use this technology with its N2P node which it will use starting in 2026. Samsung Foundry is expected to use rear power on a particular node launching next year, although Samsung Foundry has not confirmed this.
So, what is PowerVia? Most of the small wires that power a chip sit on top of all the layers that make up a silicon component. As these chips become more powerful and complex, the top wires that connect to the power sources compete with the wires that connect the components. This leads to wasted energy and low efficiency.
PowerVia moves the wires powering the chips to the back of the chip. As a result, clock speeds can increase by 6%, resulting in better performance. Add to that the performance increase gained from using a more advanced process node, and the result is a more powerful chip used to run a more powerful device.
Intel First to Take Delivery of Its High-NA Extreme Ultraviolet Lithography Machine
Intel CEO Gelsinger said: “I bet the whole company on 18A. » Intel expects the performance and efficiency of its 18A node to be higher than that of TSMC. Intel also signed an agreement with Arm allowing Arm's chip design customers to build low-power SoCs using Intel's 18A process node. Last month, Intel agreed to build a custom chip for Microsoft using its 18A process. Four large, unnamed companies (it's unclear if Microsoft is one of the four) have signed on for Intel to produce their chips using the 18A process.
Older EUV machines have an aperture of 0.33 (equivalent to 13nm resolution) and High-NA machines have an aperture of 0.55 (equivalent to 8nm resolution). With a higher resolution pattern transferred onto one wafer, the foundry could avoid having to run a wafer through the EUV machine twice to add additional features, saving both time and money. While TSMC and Samsung Foundry have both ordered one of the High-NA machines from ASML, Intel will likely be able to use the time-saving lithography machine first.